Thu, 23 Feb 2017 08:00:00 ESTA method for making a sulfur-graphene composite material is provided. In the method, an elemental sulfur solution and a graphene dispersion are provided. The elemental sulfur solution includes a first solvent and an elemental sulfur dissolved in the first solvent. The graphene dispersion includes a second solvent and graphene sheets dispersed in the second solvent. The elemental sulfur solution is added to the graphene dispersion, a number of elemental sulfur particles are precipitated and attracted to a surface of the graphene sheets to form the sulfur-graphene composite material. The sulfur-graphene composite material is separated from the mixture.
Thu, 23 Feb 2017 08:00:00 ESTProvided here is a method for making a graphene-supported metal oxide monolith, comprising: providing a graphene aerogel monolith; immersing said graphene aerogel monolith in a solution comprising at least one metal salt to form a mixture; curing said mixture to obtain a gel; optionally, heating said gel to obtain a graphene-supported metal oxide monolith.
Thu, 23 Feb 2017 08:00:00 ESTA method for manufacturing an electrolytic capacitor includes preparing a capacitor element that includes an anode body having a dielectric layer, and a separator including a cellulose fiber; impregnating the capacitor element with a first treatment solution containing a first solvent and conductive polymer particles; and impregnating, after impregnating the capacitor element with the first treatment solution, the capacitor element with a second treatment solution containing a second solvent at a state where the capacitor element includes the first solvent.
Thu, 23 Feb 2017 08:00:00 ESTIonized physical vapor deposition (IPVD) is used to form a magnetic recording disk drive write head main pole with thin side gap layers and a thicker leading gap layer. A metal or metal alloy is formed by IPVD in a trench with a bottom and outwardly sloping sidewalls. An optional Ru seed layer is deposited on the metal or metal alloy. This is followed by atomic layer deposition (ALD) of a Ru smoothing layer. If the IPVD results in metal or metal alloy side gap layers with a rough surface, the ALD process is modified, resulting in a smooth Ru smoothing layer that does not replicate the rough surface of the side gap layers.
Thu, 23 Feb 2017 08:00:00 ESTA method of manufacturing a coating for an e-paper assembly includes forming a coating layer from conductive particles dispersed within an insulative matrix. A field is applied to cause the conductive particles to align in generally parallel, spaced apart elongate patterns that are generally perpendicular to a plane through which the coating layer extends. At ambient temperatures and without applied pressure, the coating layer is cured via radiation energy while maintaining the applied field.
Thu, 23 Feb 2017 08:00:00 ESTA method of reworking a photo-alignment film for use in a liquid crystal display (LCD) includes, providing a substrate on which a photo-alignment film including a photo-reactive group is formed by irradiation of a first light polarized in a first direction, the photo-reactive group including cyclobutane dianhydride (CBDA) or a CBDA derivative and diamine; irradiating a second light polarized in a second direction, which is different from the first direction, onto the photo-alignment film; and treating the photo-alignment film with a splitting solution.
Thu, 23 Feb 2017 08:00:00 ESTThere is provided a polarizer that can realize the multi-functionalization and high-functionalization of an electronic device, such as an image display apparatus. A method of producing a polarizer of the present invention includes: bringing a basic solution into contact with a resin film containing a dichromatic substance; and reducing a content of an alkali metal and/or an alkaline earth metal in the resin film in the contact portion.
Thu, 23 Feb 2017 08:00:00 ESTGas sensing material for a gas sensor device is presented herein. In an implementation, a method includes generating a tin dioxide material by adding metal chloride and metal acetate to a mixture comprising tin dioxide and ammonium hydroxide, generating a precipitate substance by adding an organic solvent to the tin dioxide material, generating a slurry mixture from the precipitate substance by performing a centrifugation process and by adding water to the precipitate substance, generating a dry powder material by heating the slurry mixture via a heat treating process, generating an ink material by suspending the dry powder material in a surfactant substance, and printing the ink material onto a gas sensor.
Thu, 23 Feb 2017 08:00:00 ESTMethods, processes, compositions and systems for preventing leaching effects from water pipes (such as lead, steel and copper) having an inner diameter of at least approximately 12 mm. 2-part thermoset resin coating is applied to the inner surfaces of the pipes where the curing agent can be a phenol free and plasticizer free adduct type. The coating can reduce heavy metals, such as lead, from leaching from installed pipes to less than approximately 10 μg/L (10 ppb). When cured, specific leachates, Bisphenol A and Epichlorohydrin from the coatings will be (less than)
Thu, 23 Feb 2017 08:00:00 ESTA treatment device for single-stage treatment of a metal object to be treated by at least the steps of pickling and phosphating. The treatment device comprises at least the following: a treatment container for receiving the object to be treated and for receiving a flowable treatment substance; and a pump device for exchanging at least a fraction of the treatment substance. The treatment substance is flowable around at least one part of the object to be treated. The treatment substance comprises a phosphor- or phosphate-containing solution, in particular phosphoric acid. The phosphor- or phosphate-containing solution consists partly of water and partly of a reaction substance, and the reaction substance consists of phosphor or a phosphate and an additional treatment effect-improving substance. The proportion of the phosphor or phosphate in the reaction substance is at least 95%, and the reaction substance does not have a salt acid or sulfuric acid content.
Thu, 23 Feb 2017 08:00:00 ESTAn electroless silver plating bath and method of use is presented within. The electroless silver plating bath is designed to plate only on the desired metal substrate while preventing plating on areas other than those which are to be plated. The invention uses heavy metal based stabilizers in the electroless silver plating bath to prevent extraneous plating. The ability to control the amount of stabilizer present in the plating bath allows for elimination of extraneous plating and allows for a stable bath. The electroless silver plating bath is very stable and yet plates at an acceptable rate. The electroless silver plating bath prevents corrosion on the underlying metal that is plated on by using the stabilizers as described herein. The silver plating bath presented herein is useful for a wide variety of applications including those in electronic packaging, integrated circuits (IC) and in manufacturing of light emitting diodes (LEDs).
Thu, 23 Feb 2017 08:00:00 ESTA method for forming a SiN or SiCN film in a trench on a substrate by plasma-enhanced atomic layer deposition (PEALD) conducts one or more process cycles, each process cycle including: (i) feeding a precursor in a pulse to a reaction space where the substrate is place, said precursor having a Si—N—Si bond in its skeletal structure to which at least one halogen group is attached; and (ii) applying RF power to the reaction space in the presence of a reactant gas and in the absence of any precursor to form a monolayer constituting a SiN or SiCN film.
Thu, 23 Feb 2017 08:00:00 ESTThe present invention relates to a method of implanting impurities in a part. The method is remarkable in that the part is a gas diffusion device of the showerhead type in the form of a hollow body 1 having a gas admission orifice 2 and an ejection surface 3 provided with a plurality of holes, and the implanting takes place in the ejection surface.
Thu, 23 Feb 2017 08:00:00 ESTThe present invention relates to the manufacture of a hetero-element thin film and, particularly, to a method for manufacturing a doped metal chalcogenide thin film and the same thin film. The method for manufacturing a metal chalcogenide thin film of the present invention may comprise the steps of: supplying a first metal precursor that is gasified; supplying a second metal precursor that is gasified; supplying a chalcogen-containing gas; and reacting the first metal precursor, the second metal precursor, and the chalcogen-containing gas on a growing substrate at a first temperature condition to form a thin film.
Thu, 23 Feb 2017 08:00:00 ESTAn infiltration device comprises a heating room, a rotary tray, a rotary bracket, a material box, an elevating mechanism and a transmission device, wherein the heating room has an annular groove, and the rotary tray is arranged below an opening end at a lower end of the heating room; the rotary bracket is installed on the rotary tray; the material box is arranged on the rotary bracket; the rotary tray and the material box can move upward and downward under the action of the elevating mechanism; the rotary bracket can spin in the annular groove and revolve around a central axis of the rotary tray under the action of the transmission device. The infiltration method provided by the invention comprises the steps of charging, vacuum-pumping, high temperature infiltrating, cooling, discharging, etc.
Thu, 23 Feb 2017 08:00:00 ESTA system for treating wire includes an elongated vessel that contains a molten fluid. A pump is disposed in the molten fluid in the vessel. The pump includes an elongated discharge conduit extending for at least a portion of the length of the vessel. Conveyance structure enables the wire to be conveyed through the molten fluid. Operation of the pump enables a temperature of the molten fluid in the vessel to be changed. The wire is heat treated as a result of passing through the molten fluid.
Thu, 23 Feb 2017 08:00:00 ESTMethods for obtaining composites of polyaniline and reduced graphene oxide are disclosed. The methods include dispersing graphene oxide in an acid aqueous solution containing an anionic emulsifying agent to obtain a dispersion of the graphene oxide, dissolving an aniline oligomer in an organic solvent to obtain a solution of the oligomer, and mixing the solution of the oligomer with the dispersion of graphene oxide to obtain a composite of polyaniline and reduced graphene oxide. The methods may also include recovering a precipitate of the polyaniline/reduced graphene oxide composite, and dissolving the precipitate in an organic solvent to form a conductive ink or an ink for electronic devices.
Thu, 23 Feb 2017 08:00:00 ESTThe invention relates to a method of coating an aged coating layer on a substrate and a coating composition which can be used in this method. The coating composition, is typically a fouling release coating composition, and comprises a curable or crosslinkable organosiloxane polymer, an organobismuth compound and a silane coupling agent.
Thu, 23 Feb 2017 08:00:00 ESTDisclosed are Germanium- and Zirconium-containing precursors having one of the following formulae: wherein each R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 is independently selected from H; a C1-C5 linear, branched, or cyclic alkyl group; and a C1-C5 linear, branched, or cyclic fluoroalkyl groups. Also disclosed are methods of synthesizing the disclosed precursors and using the same to deposit Zirconium-containing films on substrates via vapor deposition processes.
Thu, 23 Feb 2017 08:00:00 ESTThe cobalt compound of this invention is represented by general formula (I) below. In general formula (I), R1 to R3 independently represent a straight chain or branched alkyl group having 1 to 5 carbon atoms. In addition, the thin film-forming raw material of this invention contains the cobalt compound represented by general formula (I). According to this invention, it is possible to provide a cobalt compound which can be transported in the form of a liquid due to having a low melting point, which can be decomposed at a low temperature and which can be easily vaporized due to having a high vapor pressure; and a thin film-forming raw material that uses this cobalt compound.
Thu, 23 Feb 2017 08:00:00 ESTThe present invention is directed at coatings for oven bake clay that when applied make the surface of the resulting object food safe. Among the many different possibilities contemplated, the coating may contain one or more food safe plastics that may be in particle form and may form suspensions or colloids when mixed with water, food safe oil or other food safe liquids to ease application. Among the many potential additional ingredients contemplated, the coating may contain one or more surfactants to improve the formation of a suspension or colloid or one or more food safe dyes so that the oven bake clay can be painted. Among the many methods of making the coating contemplated, the components may be mixed to form a suspension or colloid through one or more of agitation, stirring or sonication. It is further contemplated that the coating may be applied to an unbaked oven bake clay object and then baked or alternatively applied to a baked oven bake clay object and then re-baked.
Thu, 23 Feb 2017 08:00:00 ESTA spraying device comprises: a conveyer comprising a mesh crawler belt configured to carry an object to be sprayed; a baking chamber for heating the object to be sprayed; a spraying chamber having at least one atomizing nozzle disposed within the spraying chamber, the atomizing nozzle being configured to uniformly spray a coating solution on a surface of the object to be sprayed; a cleaning chamber for cleaning the mesh crawler belt and recycling the coating solution carried by the mesh crawler belt; and a solution storage apparatus for storing the coating solution that the spraying chamber needs for spraying; wherein the mesh crawler belt passes successively through the baking chamber, the spraying chamber and the cleaning chamber. The device of the present invention can ensure uniformity of the thickness of a coating layer on the magnet. In addition, the device can improve spraying efficiency and save raw material.
Thu, 23 Feb 2017 08:00:00 ESTThe invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure.
Thu, 23 Feb 2017 08:00:00 ESTA method and apparatus for applying a sealant to a structure. The method comprises scanning a surface of the structure with a vision system to form scanned data. The method further determines a sealant application path for the structure using the scanned data. The method also controls movement of an application tip along the sealant application path using a controller.
Thu, 23 Feb 2017 08:00:00 ESTThe field of the invention relates to systems and methods for surface treatments, and more particularly to systems and methods for surface treatments, modifications or coatings using micro- and nano-structure particles for both super-hydrophobic and super-oleophobic properties. In one embodiment, a method of treating surfaces to impart both super-hydrophobic and super-oleophobic properties includes the steps of pre-treating a substrate surface; assembling dual-scale nanoparticles onto the surface of the substrate; and treating the dual-scale nanoparticle coated surface with SiCl4 to cross-link the nanoparticles to each other and to the surface of the substrate creating a robust nano-structured topographic surface having both super-hydrophobic and super-oleophobic properties.
Thu, 23 Feb 2017 08:00:00 ESTA substrate is transported to a coating processing unit. An annular region of one surface of the substrate is processed. The substrate is carried into an edge exposure unit. Positions of a peripheral edge of the substrate and an inner edge of the annular region are detected. A position deviation amount of a center of the substrate held by a spin chuck from a rotation center of the spin chuck is calculated. Based on schedule management information, a relationship between orientations of the substrate held by the spin chuck at the time of carrying of the substrate into the coating processing unit and the substrate held by the substrate rotation unit at the time of carrying of the substrate into the edge exposure unit is specified. Based on the relationship, a position deviation direction of the center of the substrate from the rotation center is determined.
Thu, 23 Feb 2017 08:00:00 ESTA method comprising scanning a first painted surface of a first vehicle having two or more paint layers with a robotic terahertz radiation instrument to obtain a first painted surface thickness data and map for each of the two or more paint layers, comparing the first thickness map to a control map, and adjusting one or more paint application parameters based on a comparison of the first thickness map with the control map for painting a second surface of a second vehicle different than the first vehicle.
Thu, 23 Feb 2017 08:00:00 ESTA method for making a composite polyamide including the steps of: i) applying a polar solution comprising a polyfunctional amine monomer and a non-polar solution comprising a polyfunctional acyl halide monomer to a surface of a porous support and interfacially polymerizing the monomers to form a thin film polyamide layer; ii) treating the thin film polyamide layer with a polyfunctional arene compound; and iii) exposing the thin film polyamide layer to nitrous acid; wherein the non-polar solutions further comprises at least one of the following: (A) at least 50 vol % of a C5 to C20 aliphatic hydrocarbon and from 2 to 25 vol % of benzene or benzene substituted with one or more C1 to C6 alkyl groups; and (B) an acid-containing monomer comprising a C2-C20 hydrocarbon moiety substituted with at least one carboxylic acid functional group or salt thereof and at least one amine-reactive functional group.
Thu, 23 Feb 2017 08:00:00 ESTMethods are provided for preparing TiO2 nanofiltration membranes for water purification are provided. The method can include supplying a titanium precursor gas into a reaction chamber, where the titanium precursor gas reacts with a base support of an anodic aluminum oxide, and the base support of an anodic aluminum oxide has a surface defining a plurality of pores therein. The reaction chamber can then be evacuated to remove any unreacted titanium precursor gas, and an alkoxide precursor gas can be supplied into a reaction chamber such that the alkoxide precursor gas reacts to with the titanium on the base support to form a hybrid titanium alkoxide. Thereafter, the base support cab be heated to remove the organic component to leave titanium oxide on the surface of the base support.
Thu, 23 Feb 2017 08:00:00 ESTThe present disclosure is directed to a bioresorbable ceramic composition having a plurality of biocompatible ceramic granules, each of the granules having a coating of a plurality of calcium containing particles, where at least a portion of the particles are bound to at least a portion of an outer surface of each of the granules, and further where the composition is flowable in a dry state. The present disclosure is also directed to a three dimensional scaffold for bone repair that includes the bioresorbable composition, which upon implantation to a locus of repair defines an interconnected pore network between outer walls of the coated granules of the composition. Finally, the present disclosure is directed to methods of forming both the bioresorbable ceramic composition and the three-dimensional ceramic scaffold.
Thu, 16 Feb 2017 08:00:00 ESTThe present invention concerns a method for at least partially preventing discolouration of a substrate by a plasma coating process, by diffusing a plasma prior to and/or during depositing of said plasma on said substrate to form a coating. The present invention also concerns a plasma coating apparatus comprising a plasma diffuser for homogenizing a plasma density nearby a substrate to be coated.
Thu, 16 Feb 2017 08:00:00 ESTAn electromagnetic shielding assembly may include a transparent substrate layer and a transparent active layer positioned with respect to the substrate, wherein the active layer is configured to absorb electromagnetic radiation having a first wavelength and emit electromagnetic radiation having a second wavelength, the second wavelength being different than the first wavelength, the active layer includes fluorescent molecules combined with a base material, the fluorescent molecules being configured to absorb electromagnetic radiation having the first wavelength and emit the electromagnetic radiation having the second wavelength, wherein the first wavelength is in a visible electromagnetic spectrum and the second wavelength is in a non-visible electromagnetic spectrum.
Thu, 16 Feb 2017 08:00:00 ESTThe invention relates to a method for repairing a thermal barrier of a component comprising a substrate coated with such a thermal barrier, said substrate being made of a high-performance alloy, said thermal barrier being adhered to the alloy and having lower thermal conductivity than the alloy, the thermal barrier including at least one ceramic, one region of the thermal barrier being a region to be repaired, wherein said method includes the following steps: a) defining the region to be repaired, using a mask which protects the other regions of the thermal barrier; b) injecting a carrier gas loaded with droplets of ceramic precursor into a plasma discharge inside a plasma chamber of a plasma reactor containing the component to be repaired, while making the concentration of ceramic precursor in the carrier gas dependent on at least one parameter of the reactor selected from among: the pressure of the plasma chamber, the power of the plasma generator and the diameter of the precursor droplets, in order to control the state—liquid, gel or solid—of the ceramic precursor having an effect on the region to be repaired; c) injecting a gas not loaded with ceramic precursor into a plasma discharge within the plasma chamber, steps b) and c) being repeated.
Thu, 16 Feb 2017 08:00:00 ESTA method of making a papermaking belt is disclosed. The method comprises the steps of: (a) providing a reinforcing structure having a paper-facing side, a machine-facing side opposite the paper-facing side, interstices and a reinforcing component comprised of a plurality of structural components; (b) providing a material for coating the woven reinforcing structure; (c) placing a discrete measuring device into the material for coating the woven reinforcing structure; and, (d) coating the woven reinforcing structure with the material so that the material forms a first surface and a second surface relative to the paper-facing and machine-facing sides, the material being distributed so that the paper-facing side of the reinforcing structure and the measuring device are positioned between the first and second surfaces of the material.
Thu, 16 Feb 2017 08:00:00 ESTThe present invention relates to a method of fabricating a yarn constituted by a multi-filament core coated in a polymer sheath. The sheath is made by depositing a miscible mixture of molten polymers on the multi-filament core, the mixture comprising: at least one flame-retarding agent; andat least two polymers that, in the molten state, do not establish mutual permanent chemical bonds, with one of the polymers, referred to as the co-flame-retarding polymer, presenting both a glass transition temperature that is significantly lower than the glass transition temperature of the other polymer, referred to as the base polymer, and also a melting temperature that is likewise significantly lower than the melting temperature of the base polymer;said deposition being followed by a cooling step during which the base polymer freezes first and the co-flame-retarding polymer migrates outwards entraining at least a fraction of the flame-retarding agent therewith.
Thu, 16 Feb 2017 08:00:00 ESTA Co3W3C fishbone-like hard phase-reinforced Fe-based wear-resistant coating and the preparation thereof, which belongs to the field of a wear-resistant coating on the surface of a material and a preparation method thereof. The wear-resistant coating comprises: 1.89-3.77% of C, 5.4-11.7% of Cr, 3.3-7.15% of Ni, 28.81-57.83% of W, 4.2-8.4% of Co, 0.03-0.065% of Si and the balance of Fe. The preparation process of the wear-resistant coating comprises: (1) before plasma cladding, pretreating a matrix; (2) pretreating an iron-based alloy powder; and (3) adjusting the process parameters of plasma cladding, preparing a cladding layer with a predetermined width and a predetermined thickness, and naturally cooling same down in air. The wear-resistant coating is simple in process; the prepared cladding layer has a strong metallurgical bonding property with the matrix structure, so that the best performance matching between the ceramic phase of the cladding layer and the matrix can be achieved; a fishbone-like hard phase Co3W3C has a very high hardness value and plays the role of a framework in the frictional process to reduce the wear of the matrix structure, thereby achieving an excellent wear resistance; plasma cladding is convenient to operate, and can be automatized; and the prepared wear-resistant layer is high in size precision and can be widely applied to surface modification of mechanical parts.
Thu, 16 Feb 2017 08:00:00 ESTThere is disclosed a method for application of a metal on a substrate, comprising the steps: a) contacting at least a part of the surface of the substrate with at least one selected from: i) at least one initiator, and a polymerizable unit with the ability to undergo a chemical reaction to form a polymer, said polymer comprising at least one charged group, and ii) a polymer comprising at least one charged group. The contacting is achieved by contacting a pad with a plate comprising the at least one substance and subsequently contacting the pad with the surface of the substrate, thereby transferring the at least one substance to the surface of the substrate. Subsequently a metal layer is produced on the surface. Advantages include that the compactness of the applied metal layer increases compared to similar methods according to the prior art.
Thu, 16 Feb 2017 08:00:00 ESTPyrimidine derivatives which contain one or more electron donating groups on the ring are used as catalytic metal complexing agents in aqueous alkaline environments to catalyze electroless metal plating on metal clad and un-clad substrates. The catalysts are monomers and free of tin and antioxidants.
Thu, 16 Feb 2017 08:00:00 ESTA method of metallizing substrate with abstractable hydrogen atoms and/or unsaturations on the surface, comprising the steps: a) contacting the substrate with a polymerizable unit, at least one initiator which can be activated by both heat and actinic radiation, and optionally at least one solvent, b) inducing a polymerization reaction c) depositing a second metal on an already applied first metal to obtain a metal coating. A first metal is added as ions and/or small metal particles during the process. Ions are reduced to the first metal. Advantages include that the adhesion is improved, the process time is shortened, blisters in the metal coating are avoided, the polymer layer below the metal coating becomes less prone to swelling for instance in contact with water.
Thu, 16 Feb 2017 08:00:00 ESTA photo-assisted atomic layer deposition method includes the following steps: preparing a processing system having a processing chamber and a first gas input channel connecting the processing chamber, and the first gas input channel having a pre-chamber with a transparent side wall; introducing a first gas into the pre-chamber; illuminating the interior space of the pre-chamber by ultraviolet light via the transparent side wall; and injecting the first gas illuminated by the ultraviolet light into the processing chamber. The reactivity of the first gas can be promoted by the illumination of the ultraviolet light in the pre-chamber, so that the first gas illuminated by the ultraviolet light becomes more active to react completely in the process of film depositions, with reduced ligand residues in the deposited films.
Thu, 16 Feb 2017 08:00:00 ESTDisclosed are Hafnium-containing film forming compositions comprising Germanium- and Hafnium-containing precursors having one of the following formulae: wherein each R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 is independently selected from H; a C1-C5 linear, branched, or cyclic alkyl group; and a C1-C5 linear, branched, or cyclic fluoroalkyl groups. Also disclosed are methods of synthesizing the disclosed compositions and using the same to deposit Hafnium-containing films on substrates via vapor deposition processes.
Thu, 16 Feb 2017 08:00:00 ESTA device for printing silicon sealant, including a coating device, a horizontal coating stage, and an elevating device, wherein: the elevating device is connected with the horizontal coating stage and is configured to adjust the height of the horizontal coating stage; the horizontal coating stage can be moved to a position right below a screen and fully contacted with the screen under the adjustment of the elevating device; and the coating device is configured to be moved to a position above the screen to coat silicon sealant in a pattern area of the screen after the horizontal coating stage is fully contacted with the screen.
Thu, 16 Feb 2017 08:00:00 ESTRTV-1 compositions, despite containing conventional alkoxysilyl-terminated polymers, exhibit rapid cure and excellent physical properties when they further contain silicone resins, and employ metal, amidine, or guanidine curing catalysts C1 and amine-containing cocatalysts C2 in specific mole ratios.
Thu, 16 Feb 2017 08:00:00 ESTA copolymerized polysilazane comprising at least repeating units represented by general formula (I): —Si(R1)(R2)—NR3— and repeating units represented by general formula (II): —Si(R1)(R2)—NH— (in the formulas, R1 and R2 each independently represent a hydrogen atom, hydrocarbon group, hydrocarbon group-containing silyl group, hydrocarbon group-containing amino group, or hydrocarbon oxy group, and R3 represents an alkyl group, alkenyl group, alkoxy group, cycloalkyl group, aryl group or alkyl silyl group), and the NR3/SiH1,2 ratio (SiH1,2 represents the total amount of SiH1 and SiH2) is 0.005-0.3. Said copolymerized polysilazane can be manufactured by reacting Si(R1)(R2)X2 (in the formula, X represents a halogen atom) with a primary amine compound: R3NH2 and then reacting with ammonia, and is able to form a siliceous film that has withstand voltage characteristics and solvent resistance by curing at a low temperature.
Thu, 16 Feb 2017 08:00:00 ESTThe present application discloses a one-part room temperature vulcanizable (RTV) poly(diorganosiloxane) composition for a superhydrophobic elastomeric silicone coating; a method of coating a high voltage insulator using such a composition and a coated high voltage insulator prepared by such a method or using such a composition. The present application also discloses methods of protecting a substrate, of waterproofing a substrate, for reducing drag on a substrate and/or for inhibiting water from pooling on a horizontal or near-horizontal substrate using such a composition.
Thu, 16 Feb 2017 08:00:00 ESTA solder mask ink for aerosol jet printing includes a metal oxide and a propylene glycol-based solvent; the solder mask ink has a viscosity from about 50 cps to about 1,000 cps at shear rate of 10 1/s at 25° C., and a shear thinning index from about 1.0 to about 2.0.
Thu, 16 Feb 2017 08:00:00 ESTProvided is a composition for forming a low-refractive-index film, which exhibits an excellent antireflective function even when applied in a single layer and does not affect the environment, and which is characterized by comprising (A) an inorganic polysilazane and (B) at least one organic polymer selected from a silazane-containing organic polymer, a siloxazane-containing organic polymer and a ureasilazane-containing organic polymer, wherein the ratio (A):(B) is 40:60-17:83 by weight.
Thu, 16 Feb 2017 08:00:00 ESTThe present invention concerns a method for coating a textile material with a silicone elastomer composition crosslinkable by condensation reactions, to produce a solid silicone elastomer, optionally in a thin layer, on a flexible support that can be made from a textile material, paper, polyvinyl chloride, polyester, polypropylene, polyamide, polyethylene, polyurethane, non-woven glass fibre fabric or polyethylene terephthalate.
Thu, 16 Feb 2017 08:00:00 ESTDisclosed are Hafnium-containing film forming compositions comprising Silicon- and Hafnium-containing precursors having one of the following formulae: wherein each R1, R2, R3, R4, R5, R6, R7, Fe, R9 and R19 is independently selected from H; a C1-C5 linear, branched, or cyclic alkyl group; or a C1-C5 linear, branched, or cyclic fluoroalkyl group. Also disclosed are methods of synthesizing the disclosed compositions and using the same to deposit Hafnium-containing thin films on substrates via vapor deposition processes.
Thu, 16 Feb 2017 08:00:00 ESTThis invention provides a copper compound represented by General Formula (I) below. In General Formula (I), R1 to R3 independently represent a linear or branched alkyl group with a carbon number of 1 to 5; provided that R1 and R2 are a methyl group, R3 represents a linear or branched alkyl group with a carbon number of 2 to 5; and provided that R1 is a methyl group and R2 is an ethyl group, R3 represents a methyl group or a linear or branched alkyl group with a carbon number of 3 to 5. A starting material for forming a thin film of the present invention includes the copper compound represented by General Formula (I). The present invention can provide a copper compound which has a low melting point, can be conveyed in a liquid state, has a high vapor pressure, and is easily vaporizable, and also a starting material for forming a thin film which uses such a copper compound.